Agilent 7700s ICP-MS

The Agilent 7700s ICP-MS is configured for the ultra-trace elemental analysis of high purity materials such as those monitored in the semiconductor industry. With a high efficiency sample introduction system, optional 5th plasma gas line, and second (reaction) cell gas line as standard, the 7700s offers high performance for the removal of intense interferences in known and consistent matrices. With unmatched cool plasma capability, the 7700s also delivers industry-leading performance for the measurement of easily ionized elements in high-purity materials, allowing all common semiconductor analytical methods to be performed on the same instrument.

Features

• Enhanced performance in helium mode with a new 3rd generation ORS³
• Unmatched cool plasma performance – the industry standard method for Li, Na, K, Fe and Ca in simple matrices such as deionized water, peroxide, HF, etc.
• Reaction mode using hydrogen cell gas as standard, and optional 3rd cell gas line for other reaction gases, such as NH₃
• Built-in tuning and method templates for all common semiconductor applications, including collision/reaction mode and cool plasma mode ensure the highest data quality and lowest BECs
• Standard Operating Procedures for all common semicon sample types to simplify your method development
• Lower heat output and reduced exhaust vent flow, with a redesigned cooling air-flow management system - particularly important in clean-room installations
• Enhanced data analysis and reporting with powerful new MassHunter software platform
• New compact design – the world’s smallest commercial ICP-MS saves you valuable work bench and lab space